Atomistic mechanism for the macroscopic effects induced by small additions of surfactants to alkaline etching solutions

Sensors and Actuators, A: Physical

Volumn 157, Issue 1, 2010, Pages 91-95

  Gosalvez M A ^a   Pal, P ^a   Tang, B ^a   Sato, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Anisotropic wet etching; Convex corner undercutting; MEMS; Spectroscopic ellipsometry; Surfactant adsorption; TMAH; Triton X 100

Indexed keywords

ANISOTROPIC WET ETCHING; CONVEX CORNERS; SURFACTANT ADSORPTION; TMAH; TRITON X-100;

ADSORPTION; AMMONIUM COMPOUNDS; ANISOTROPIC ETCHING; ANISOTROPY; MEMS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS;

WET ETCHING;

EID: 76449104374     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2009.10.023     Document Type: Letter

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