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Volumn 9, Issue 3-4, 2012, Pages 499-502

Effects of carrier gas ratio and growth temperature on MOVPE growth of AlN

Author keywords

AlN; MOVPE; Nitrides; Sapphire

Indexed keywords

ALN; ALN LAYERS; ALN-LAYER GROWN; ATOMIC LEVELS; CARRIER GAS; COMPRESSIVE STRAIN; CRACK FREE; DEEP-ULTRAVIOLET REGIONS; GROWTH CONDITIONS; HIGH QUALITY; HIGH TEMPERATURE; MEDIUM TEMPERATURE; METAL-ORGANIC VAPOR PHASE EPITAXY; MOVPE GROWTH; RADIUS OF CURVATURE; SAPPHIRE SUBSTRATES; SMOOTH SURFACE; STRONG DEMAND; SURFACE MIGRATION;

EID: 84858962694     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201100712     Document Type: Article
Times cited : (17)

References (11)
  • 7
    • 84858983914 scopus 로고    scopus 로고
    • 5t Asia-Pacific Workshop on Widegap Semiconductors (APWS2011), Mo-P58.
    • R. Miyagawa, S. Yang, H. Miyake, and K. Hiramatsu, 5t Asia-Pacific Workshop on Widegap Semiconductors (APWS2011), Mo-P58.
    • Miyagawa, R.1    Yang, S.2    Miyake, H.3    Hiramatsu, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.