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Volumn 520, Issue 12, 2012, Pages 4144-4149
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Etching process optimization using NH 4Cl aqueous solution to texture ZnO:Al films for efficient light trapping in flexible thin film solar cells
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Author keywords
Etching; Light scattering; RF sputtering; Surface morphology; ZnO:Al
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Indexed keywords
ALUMINUM-DOPED ZINC OXIDE;
AS-DEPOSITED FILMS;
CHEMICAL ETCHING;
ETCHED SURFACE;
ETCHING METHOD;
ETCHING PROCESS;
FLEXIBLE THIN FILM SOLAR CELLS;
GRAIN SIZE;
HAZE FACTORS;
LIGHT-TRAPPING;
PET SUBSTRATE;
RADIO FREQUENCY MAGNETRON SPUTTERING;
RF-SPUTTERING;
TEXTURED SURFACE;
VISIBLE-WAVELENGTH RANGE;
ZNO;
ZNO:AL FILMS;
ALUMINUM;
ALUMINUM COATINGS;
CHEMICAL ANALYSIS;
CHLORINE;
DOPING (ADDITIVES);
ETCHING;
LIGHT SCATTERING;
OPTIMIZATION;
POLYETHYLENE TEREPHTHALATES;
SOLUTIONS;
SUBSTRATES;
SURFACE MORPHOLOGY;
SURFACE ROUGHNESS;
ZINC OXIDE;
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EID: 84858701683
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.207 Document Type: Conference Paper |
Times cited : (17)
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References (22)
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