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Volumn 520, Issue 12, 2012, Pages 4144-4149

Etching process optimization using NH 4Cl aqueous solution to texture ZnO:Al films for efficient light trapping in flexible thin film solar cells

Author keywords

Etching; Light scattering; RF sputtering; Surface morphology; ZnO:Al

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; AS-DEPOSITED FILMS; CHEMICAL ETCHING; ETCHED SURFACE; ETCHING METHOD; ETCHING PROCESS; FLEXIBLE THIN FILM SOLAR CELLS; GRAIN SIZE; HAZE FACTORS; LIGHT-TRAPPING; PET SUBSTRATE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-SPUTTERING; TEXTURED SURFACE; VISIBLE-WAVELENGTH RANGE; ZNO; ZNO:AL FILMS;

EID: 84858701683     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.207     Document Type: Conference Paper
Times cited : (17)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.