Nitrogen introduction in pp-HMDSO thin films deposited by atmospheric pressure dielectric barrier discharge: An XPS study

Plasma Processes and Polymers

Volumn 9, Issue 3, 2012, Pages 316-323

  Maurau, Rémy ^a   Boscher, Nicolas D ^a   Guillot, Jérôme ^a   Choquet, Patrick ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

Author keywords

dielectric barrier discharges (DBD); ESCA XPS; FT IR; hexamethyldisiloxane (HMDSO); nitrogen

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; CHAIN GROWTH; CHAIN TERMINATIONS; CHEMICAL PRECURSORS; DEPOSITION PROCESS; DIELECTRIC BARRIER DISCHARGES; ESCA/XPS; FT-IR; HEXAMETHYL DISILOXANE; MOLECULAR NITROGEN; NITROGEN CONTENT; OPTICAL EMISSIONS; POLYMER CHAINS;

ARGON; ATMOSPHERIC PRESSURE; COATINGS; CROSSLINKING; DEPOSITION; DIELECTRIC DEVICES; EMISSION SPECTROSCOPY; FLOW CONTROL; LIGHT EMISSION; PLASMA APPLICATIONS; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN;

EID: 84858186094     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100144     Document Type: Article

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