Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films

Journal of Materials Research

Volumn 27, Issue 5, 2012, Pages 829-836

  Mosquera, Adolfo ^a   Horwat, David ^b   Vazquez, Luis ^a   Gutiérrez, Alejandro ^c   Erko, Alexei ^d   Anders, André ^e   Andersson, Joakim ^f   Endrino, Jose L ^g  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUT JEAN LAMOUR   (France)

^c INSTITUTO NICOLÁS CABRERA   (Spain)

^d HAHN MEITNER INSTITUT   (Germany)

^e UNIVERSITY OF CALIFORNIA   (United States)

^f UPPSALA UNIVERSITY   (Sweden)

^g ABENGOA RESEARCH   (Spain)

Author keywords

Annealing; Bonding; Pt

Indexed keywords

AMORPHOUS-LIKE; ANNEALING TEMPERATURES; FRACTAL CHARACTERISTICS; FRACTAL PROPERTIES; PLATINUM OXIDE; POROUS PLATINUM; SCANNING ELECTRON MICROSCOPY IMAGE; SPUTTERING TECHNIQUES; THERMAL EVOLUTION; X RAY PHOTOELECTRON SPECTROSCOPIES (XPS); X-RAY ABSORPTION NEAR-EDGE STRUCTURE; XANES; XPS SPECTRA; XRD SPECTRA;

ANNEALING; ATOMIC FORCE MICROSCOPY; BONDING; DECOMPOSITION; ELECTRONIC STRUCTURE; FRACTALS; OXIDE FILMS; PLATINUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

PLATINUM;

EID: 84857864706     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.418     Document Type: Article

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