Fractal processing of AFM images of rough ZnO films

Materials Characterization

Volumn 48, Issue 2-3, 2002, Pages 169-175

  Sun, Xia ^a   Fu, Zhuxi ^a   Wu, Ziqin ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; FRACTALS; IMAGE PROCESSING; SURFACE ROUGHNESS; ZINC OXIDE;

FRACTAL IMAGE PROCESSING;

THIN FILMS;

EID: 0036526514     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(02)00205-X     Document Type: Conference Paper

References (15)

1. The effect of Zn buffer layer on growth and luminesence of ZnO films deposited on Si substrates
2. Effects of post-annealing treatment on the light emission properties of ZnO thin films on Si
3. Defect photoluminescence of undoping ZnO films and its dependence on annealing conditions
4. Fractal analysis of scanning probe microscopy images
5. Fractals in annealed Ge-Au/Au bilayer films
6. Multifractal characteristics of magnetic-microsphere aggregates in thin films
7. Phase transition in the multifractal spectrum diffusion-limited aggregation
8. Is the geometry of nature fractal?
9. Scaling range and cutoffs in empirical fractals
10. Multifractal behavior of the distribution of secondary emission sites on solid surfaces
11. Multifractal analysis of the spatial distribution of secondary-electron emission sites
12. Multifractal behavior of solid-on-solid growth