Highly tolerant a-Si distributed Bragg reflector fabricated by oblique angle deposition

Optical Materials Express

Volumn 1, Issue 3, 2011, Pages 451-457

  Jang, Sung Jun ^a   Song, Young Min ^a   Yeo, Chan Il ^a   Park, Chang Young ^a   Lee, Yong Tak ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI FILMS; HIGH INDEX CONTRAST MATERIAL; OBLIQUE ANGLES; OBLIQUE-ANGLE DEPOSITION; STOP-BANDS;

DISTRIBUTED BRAGG REFLECTORS; FABRICATION; REFRACTIVE INDEX;

SILICON;

EID: 84857847910     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.1.000451     Document Type: Article

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