Oxidized GaAs/AlAs mirror with a quantum-well saturable absorber for ultrashort-pulse Cr4+:YAG laser

Optics Communications

Volumn 214, Issue 1-6, 2003, Pages 285-289

  Ripin, D J ^a,b,c   Gopinath, J T ^a,b,c   Shen, H M ^a,b,c   Erchak, A A ^a,b,c   Petrich, G S ^a,b,c   Kolodziejski, L A ^a,b,c   Kartner F X ^a,b,c   Ippen, E P ^a,b,c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b USA   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Ultrafast processes

Indexed keywords

DISPERSIONS; OXIDATION; SEMICONDUCTING GALLIUM ARSENIDE; ULTRAFAST PHENOMENA; ULTRASHORT PULSES;

BRAGG REFLECTORS;

QUANTUM WELL LASERS;

EID: 0037448212     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(02)02127-2     Document Type: Article

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