Origin of particles during reactive sputtering of oxides using planar and cylindrical magnetrons

Applied Optics

Volumn 51, Issue 7, 2012, Pages 927-935

  Rademacher, Daniel ^a   Fritz, Benjamin ^a   Vergöhl, Michael ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DEFECTS; LASER DAMAGE; MAGNETRON SPUTTERING; OXIDE FILMS; REACTIVE SPUTTERING; SPUTTERING; THIN FILMS;

CYLINDRICAL TARGET; LASER INDUCED DAMAGE THRESHOLDS; MANUFACTURING PROCESS; OPTICAL PERFORMANCE; OPTICAL THIN FILMS; PARTICLE CONTAMINATION; REACTIVE MAGNETRON SPUTTERING; STRONG DEPENDENCES;

OPTICAL FILMS;

EID: 84857822657     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.51.000927     Document Type: Conference Paper

References (26)

1. J. Strobel and R. M. Hohl, "Cleaning of parts for precisionoptic and glass substrates before coating," in Proceedings of the 46th Annual Technical Conference (Society of Vacuum Coaters, 2003), pp. 359-364.
2. F. Sequeda and G. S. Selwyn, "In situ analysis of particle contamination in magnetron sputtering process during magnetic media manufacturing," in Proceedings of the 44th Annual Technical Conference (Society of Vacuum Coaters, 2001), pp. 29-34.
3. P. Borden and J. Mason, "Monitoring particles in sputter coaters," Proceedings of the 34th Annual Technical Conference (Society of Vacuum Coaters, 1991), pp. 365-371.
4. M. Vergöhl, C. Rickers, U. Kricheldorf, K. Schiffmann, and P. Giesel, "Deposition of multilayer optical films and Rugate filters deposited by reactive magnetron sputtering," in Proceedings of the 49th Annual Technical Conference (Society of Vacuum Coaters, 2006), Vol. 49, pp. 265-270.
5. M. Vergöhl, O. Werner, and S. Bruns, "New developments in magnetron sputter processes for precision optics," Proc. SPIE 7101, 71010B (2008).
6. B. Szyszka, T. Höing, X. Jiang, A. Bierhals, N. Malkomes, M. Vergöhl, V. Sittinger, U. Bringmann, and G. Bräuer, "Large area deposition of transparent and conductive ZnO:Al layers by reactive mid frequency magnetron sputtering," in Proceedings of the 34th Annual Technical Conference (Society of Vacuum Coaters, 2001), pp. 272-276. (Pubitemid 33148790)
7. C. Buzea and K. Robbie, "State of the art in thin film thickness and deposition rate monitoring sensors," Rep. Prog. Phys. 68, 385-409 (2005). (Pubitemid 41236874)
8. R. J. Hill and F. Jansen, "The use of ac power on cylindrical magnetrons: Coatings on glass," J. Non-Cryst. Solids 218, 35-37 (1997). (Pubitemid 127369640)
9. R. J. Hill, S. Nadel, and P. Petrach, "Large area deposition by mid-frequency AC sputtering," in Proceedings of the 41st Annual Technical Conference (Society of Vacuum Coaters, 1998), pp. 197-202.
10. W. Bosscher, D. Cnockaert, and H. Lievens, "Advances in cylindrical magnetrons," in Proceedings of the 42nd Annual Technical Conference (Society of Vacuum Coaters, 1999), pp. 156-162. (Pubitemid 129305226)
11. K. Koski, J. Hölsä, and P. Juliet, "Surface defects and arc generation in reactive magnetron sputtering of aluminium oxide thin films," Surf. Coat. Technol. 115, 163-171 (1999).
12. A. Anders, "Physics of arcing, and implications to sputter deposition," in Selected Papers from the 5th International Conference on Coatings on Glass (ICCG5)-Advanced Coatings on Glass and Plastics for Large-Area or High-Volume Products, ICCG-5 (ICCG Association, 2006), pp. 22-28. (Pubitemid 43290027)
13. S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, "Pulsed magnetron sputter technology," Surf. Coat. Technol. 61, 331-337 (1993).
14. G. Bräuer, J. Szczyrbowski, and G. P. Teschner, "New approaches for reactive sputtering of dielectric materials on large scale substrates," J. Non-Cryst. Solids 218, 19-24 (1997).
15. P. J. Kelly and R. D. Arnell, "Magnetron sputtering: A review of recent developments and applications," Vacuum 56(3), 159-172 (2000). (Pubitemid 30564470)
16. P. J. Kelly, T. Vom Braucke, Z. Liu, R. D. Arnell, and E. D. Doyle, "Pulsed magnetron sputtered titanium nitride coatings for improved tribological performance and tool life," in Proceedings of the 50th Annual Technical Conference (Society of Vacuum Coaters, 2007), pp. 596-601.
17. M. Vergoehl, P. Frach, H. Bartzsch, A. Pflug, and C. Rickers, "Process technology, applications and potentials of magnetron sputtering technology for optical coatings," in Optical Interference Coatings (Optical Society of America, 2007), MA3.
18. G. S. Selwyn, C. A. Weiss, F. Sequeda, and C. Huang, "In-situ analysis of particle contamination in magnetron sputtering processes," Thin Solid Films 317, 85-92 (1998). (Pubitemid 128422195)
19. H. Miyashita, T. Kikuchi, Y. Kawasaki, Y. Katakura, and N. Ohsako, "Particle measurements in vacuum tools by in situ particle monitor," J. Vac. Sci. Technol. A 17, 1066-1070 (1999). (Pubitemid 129650480)
20. M. Abràmoff, P. MagalhÃes, and S. Ram, "Image processing with ImageJ," Biophotonics Int. 11(7), 36-42 (2004).
21. W. S. Rasband, "ImageJ," http://imagej.nih.gov/ij/, 1997-2011.
22. S. Berg and T. Nyberg, "Fundamental understanding and modeling of reactive sputtering processes," Thin Solid Films 476, 215-230 (2005). (Pubitemid 40259151)
23. J. Musil, P. Baroch, J. Vlcek, K. H. Nam, and J. G. Han, "Reactive magnetron sputtering of thin films: Present status and trends," Thin Solid Films 475, 208-218 (2005). (Pubitemid 40210991)
24. I. Safi, "Recent aspects concerning DC reactive magnetron sputtering of thin films: A review," Surf. Coat. Technol. 127, 203-218 (2000).
25. N. Malkomes and M. Vergöhl, "Dynamic simulation of process control of the reactive sputter process and experimental results," J. Appl. Phys. 127, 1-8 (2001).
26. C. E. J.Wickersham, J. E. Poole, and J. S. Fan, "Arc generation from sputtering plasma-dielectric inclusion interactions," J. Vac. Sci. Technol. A 20, 833-838 (2002). (Pubitemid 34648327)