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Volumn 218, Issue , 1997, Pages 35-37

The use of ac power on cylindrical magnetrons

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POWER SUPPLIES TO APPARATUS; HISTORY; MAGNETRONS;

EID: 0031549313     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00195-6     Document Type: Article
Times cited : (11)

References (22)
  • 4
    • 0040806297 scopus 로고    scopus 로고
    • private communication
    • H. Kumagi, private communication.
    • Kumagi, H.1
  • 13
    • 0040211917 scopus 로고    scopus 로고
    • DD-Pat 252 205 A1 (Sept. 1986)
    • V. Kirchhoff et al., DD-Pat 252 205 A1 (Sept. 1986).
    • Kirchhoff, V.1
  • 15
    • 0040806295 scopus 로고    scopus 로고
    • DE-Pat 38 02 852 C2 (Feb. 1988)
    • W.-D. Munz et al., DE-Pat 38 02 852 C2 (Feb. 1988).
    • Munz, W.-D.1
  • 18
    • 0042449220 scopus 로고
    • Planar magnetron sputtering
    • ed. J.L. Vossen and W. Kem Academic Press, Orlando, FL, USA
    • R.K. Waits, 'Planar magnetron sputtering', in: Thin Film Processes, ed. J.L. Vossen and W. Kem (Academic Press, Orlando, FL, USA, 1978).
    • (1978) Thin Film Processes
    • Waits, R.K.1
  • 19
    • 0039027941 scopus 로고    scopus 로고
    • Patent applied for
    • Patent applied for.
  • 22
    • 0039027947 scopus 로고    scopus 로고
    • These Proceedings
    • These Proceedings.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.