Fabrication of quasiperiodic nanostructures with EUV interference lithography

Nanotechnology

Volumn 23, Issue 10, 2012, Pages

  Langner, A ^a   Paivanranta B ^a   Terhalle, B ^a   Ekinci, Y ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; FEATURE SIZES; HIGH QUALITY; HIGH RESOLUTION; INTERFERENCE LITHOGRAPHY; MASK MANUFACTURING; QUASI-PERIODIC; QUASI-PERIODIC STRUCTURES;

FABRICATION; NANOSTRUCTURES;

QUALITY CONTROL;

EID: 84857613815     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/10/105303     Document Type: Article

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