Advanced holographic methods in extreme ultraviolet interference lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8102, Issue , 2011, Pages

  Terhalle, Bernd ^a   Langner, Andreas ^a   Päivänrantaa, Birgit ^a   Ekinci, Yasin ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

EUV interference lithography

Indexed keywords

BEAM SHAPES; COMPLEX PATTERN; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; HIGH RESOLUTION; HOLOGRAPHIC METHOD; INTERFERENCE LITHOGRAPHY; MULTIPLE BEAM; QUASI-PERIODIC; RELATIVE PHASE;

FABRICATION; OPTICS;

LITHOGRAPHY;

EID: 80054067563     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.893733     Document Type: Conference Paper

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