Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100keV electron beam lithography

Nanotechnology

Volumn 21, Issue 28, 2010, Pages

  Vila Comamala, Joan ^a   Gorelick, Sergey ^a   Guzenko, Vitaliy A ^a   Färm, Elina ^b   Ritala, Mikko ^b   David, Christian ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE GRATINGS; EXCELLENT PERFORMANCE; FRESNEL ZONE PLATE; GOLD ELECTRODEPOSITION; HIGH ASPECT RATIO; HIGH CONTRAST; HYDROGEN SILSESQUIOXANE; PHOTON ENERGY; SCANNING TRANSMISSION X RAY MICROSCOPY; THICK RESIST;

ATOMIC LAYER DEPOSITION; CARBON DIOXIDE; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; GOLD COATINGS; GOLD DEPOSITS; IRIDIUM; NANOSTRUCTURES; PHOTORESISTS; PRESSURE DROP; SELF ASSEMBLY;

ASPECT RATIO;

EID: 77954146866     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/28/285305     Document Type: Article

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