SCOPUS 정보 검색 플랫폼

Volumn 5, Issue 3, 2012, Pages 6052-6056

Heteroepitaxial film silicon solar cell grown on Ni-W foils

(12) Wee, Sung Hun a Cantoni, Claudia a Fanning, Thomas R b Teplin, Charles W c Bogorin, Daniela F a Bornstein, Jon b Bowers, Karen b Schroeter, Paul b Hasoon, Falah c Branz, Howard M c Paranthaman, M Parans a Goyal, Amit a

a OAK RIDGE NATIONAL LABORATORY (United States)

b Ampulse Corporation (United States)

c NATIONAL RENEWABLE ENERGY LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL TEXTURES; BUFFER ARCHITECTURE; EPITAXIAL OXIDE LAYERS; HETEROEPITAXIAL; HETEROEPITAXIAL FILMS; HIGH QUALITY; HIGH-EFFICIENCY SOLAR CELLS; METAL SUBSTRATE; POLE FIGURE; PROOF OF CONCEPT; SEMICONDUCTOR FILMS; SI FILMS; SI SOLAR CELLS; XRD ANALYSIS;

CONVERSION EFFICIENCY; EPITAXIAL FILMS; OXIDE FILMS; SILICON; SILICON SOLAR CELLS; SUBSTRATES;

EPITAXIAL GROWTH;

FILM; FUEL CELL; NICKEL; SILICON; SUBSTRATE; X-RAY DIFFRACTION;

EID: 84857600809 PISSN: 17545692 EISSN: 17545706 Source Type: Journal
DOI: 10.1039/c2ee03350j Document Type: Article

Times cited : (42)

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