8% efficient thin-film polycrystalline-silicon solar cells based on aluminum-induced crystallization and thermal CVD

Progress in Photovoltaics: Research and Applications

Volumn 15, Issue 7, 2007, Pages 575-586

  Gordon, I ^a   Carnel, L ^a   Van Gestel, D ^a   Beaucarne, G ^a   Poortmans, J ^a  

^a IMEC   (Belgium)

Author keywords

Aluminum induced crystallization; CVD; Heterojunction; Plasma texturing; Polycrystalline; Silicon; Spin on oxide; Thin film

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; CURRENT DENSITY; HETEROJUNCTIONS; POLYSILICON; THIN FILMS;

ALUMINUM-INDUCED CRYSTALLIZATION; EMITTER CONTACTS; PLASMA TEXTURING; SPIN-ON OXIDE;

SOLAR CELLS;

EID: 35448990488     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.765     Document Type: Article

References (24)

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