Current and future applications of ALD in micro-electronics

ECS Transactions

Volumn 41, Issue 2, 2011, Pages 3-17

  Raaijmakers, Ivo J ^a  

^a ASM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DEPOSITION RATES; INTEGRATED CIRCUITS;

FUTURE APPLICATIONS; IC MANUFACTURING;

ATOMIC LAYER DEPOSITION;

EID: 84857312958     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3633649     Document Type: Conference Paper

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