Covalent layer-by-layer assembly of redox active molecular multilayers on silicon (100) by photochemical thiol-ene chemistry

Small

Volumn 8, Issue 4, 2012, Pages 569-577

  Schulz, Christian ^a   Nowak, Susann ^a   Fröhlich, Roland ^a   Ravoo, Bart Jan ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

electrochemistry; ferrocene; layer by layer deposition; multilayers; silicon

Indexed keywords

CLICK CHEMISTRY; COVALENTLY BOUND; FERROCENES; HIGH DEGREE OF FREEDOM; LAYER BY LAYER DEPOSITION; LAYER GROWTH; LAYER-BY-LAYER ASSEMBLIES; MICRO CONTACT PRINTING; MICROELECTRONIC APPLICATIONS; MOLAR DENSITY; MOLECULAR MULTILAYERS; MULTILAYER GROWTH; REDOX-ACTIVE; SILICON (100); SILICON SUBSTRATES; THIN ORGANIC FILMS; THIOL-ENE REACTIONS; THIOL-ENES; X-RAY PHOTOELECTRONS;

ATOMIC FORCE MICROSCOPY; CYCLIC VOLTAMMETRY; DEPOSITION; ELECTROCHEMISTRY; ELECTRON DEVICE MANUFACTURE; FILM PREPARATION; FILMS; IRON COMPOUNDS; MICROELECTRONICS; ORGANOMETALLICS; PHOTOCHEMICAL REACTIONS; REDOX REACTIONS; SILICON;

MULTILAYERS;

EID: 84857281244     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201101822     Document Type: Article

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