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Chemical Communications

Volumn 48, Issue 22, 2012, Pages 2797-2799

A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

(6) Goethals, Frederik a Baklanov, Mikhail R b Ciofi, Ivan b Detavernier, Christophe a Van Der Voort, Pascal a Van Driessche, Isabel a

a GHENT UNIVERSITY (Belgium)

b IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HEXAMETHYLDISILOXANE; OLIGOMER; ORGANOSILICON DERIVATIVE; SEALANT;

ADSORPTION; ARTICLE; CHEMICAL STRUCTURE; DESORPTION; DIELECTRIC CONSTANT; FILM; OLIGOMERIZATION; PARTICLE SIZE; POROSITY; THICKNESS;

EID: 84857226362 PISSN: 13597345 EISSN: 1364548X Source Type: Journal
DOI: 10.1039/c2cc18017k Document Type: Article

Times cited : (24)

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