Nanostructure and internal strain distribution in porous silicon

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 10, 2011, Pages 9136-9142

  Miu, Mihaela ^a   Danila, Mihai ^a   Kleps, Irina ^a   Bragaru, Adina ^a   Simion, Monica ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

Nanostructured Material; Porous Silicon; Raman Spectroscopy; Strain; Triple Axis X ray Diffraction

Indexed keywords

COMPLEMENTARY METHODS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HIGH RESOLUTION X RAY DIFFRACTION; HIGHLY STRAINED; INTERNAL STRAINS; MEMS TECHNOLOGY; RECIPROCAL SPACE MAPS; ROCKING CURVES; SMALL ANGLE X-RAY SCATTERING; STRAIN ANALYSIS; STRAIN LAYERS; SUPERFICIAL LAYERS; TRIPLE-AXIS X-RAY DIFFRACTIONS;

FIELD EMISSION MICROSCOPES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; STRAIN; X RAY DIFFRACTION;

POROUS SILICON;

EID: 84857180256     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.4305     Document Type: Conference Paper

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