Nanopatterning on nonplanar and fragile substrates with ice resists

Nano Letters

Volumn 12, Issue 2, 2012, Pages 1018-1021

  Han, Anpan ^a,c   Kuan, Aaron ^a   Golovchenko, Jene ^a   Branton, Daniel ^b  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c AARHUS UNIVERSITY   (Denmark)

Author keywords

e beam lithography; ice lithography; nanopatterning; Nonplanar; resists

Indexed keywords

E-BEAM LITHOGRAPHY; ICE LITHOGRAPHY; NANOPATTERNING; NONPLANAR; RESISTS;

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; NANOSTRUCTURED MATERIALS; NANOTUBES; POLYMERS; TRANSMISSION ELECTRON MICROSCOPY;

ICE;

ICE; NANOMATERIAL;

ARTICLE; CHEMISTRY; ELECTRON; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY;

ELECTRONS; ICE; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 84856959840     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl204198w     Document Type: Article

References (19)

1. King, G. M.; Schurmann, G.; Branton, D.; Golovchenko, J. A. Nano Lett. 2005, 5, 1157-1160
2. Han, A.; Vlassarev, D.; Wang, J.; Golovchenko, J. A.; Branton, D. Nano Lett. 2010, 10, 5066-5059
3. Han, A.; Chervinsky, J.; Branton, D.; Golovchenko, J. A. Rev. Sci. Instrum. 2011, 82, 065110-065111-065110-065116
4. Yeo, B. S.; Stadler, J.; Schmid, T.; Zenobi, R.; Zhang, W. H. Chem. Phys. Lett. 2009, 472, 1-13
5. Martin, J.; Akerman, N.; Ulbricht, G.; Lohmann, T.; Smet, J. H.; Von Klitzing, K.; Yacoby, A. Nat. Phys. 2008, 4, 144-148
6. Treutlein, P.; Hunger, D.; Camerer, S.; Hansch, T. W.; Reichel, J. Phys. Rev. Lett. 2007, 99, 140403-140401-140403-140404
7. Bleszynski-Jayich, A. C.; Shanks, W. E.; Peaudecerf, B.; Ginossar, E.; von Oppen, F.; Glazman, L.; Harris, J. G. E. Science 2009, 326, 272-275
8. Bleszynski-Jayich, A. C.; Shanks, W. E.; Ilic, B. R.; Harris, J. G. E. J. Vac. Sci. Technol., B 2008, 26, 1412-1416
9. Brandli, G.; Olsen, J. L. Mater. Sci. Eng. 1969, 4, 61-83
10. Chopra, K. L.; Bobb, L. C. Acta Metall. 1963, 12, 807-811
11. Utke, I.; Hoffmann, P.; Melngailis, J. J. Vac. Sci. Technol., B 2008, 26, 1197-1276
12. Koh, A. L.; Fernandez-Dominguez, A. I.; McComb, D. W.; Maier, S. A.; Yang, J. K. W. Nano Lett. 2011, 11, 1323-1330
13. Schuller, J. A.; Barnard, E. S.; Cai, W.; Jun, Y. C.; White, J. S.; Brongersma, M. L. Nat. Mater. 2010, 9, 193-204
14. Li, J.; Stein, D.; McMullan, C.; Branton, D.; Aziz, M. J.; Golovchenko, J. A. Nature 2001, 412, 166-169
15. Farmer, D. B.; Gordon, R. G. Nano Lett. 2006, 6, 699-703
16. Parikh, D.; Craver, B.; Nounu, H. N.; Fong, F.-O.; Wolfe, J. C. J. Microelectromech. Syst. 2008, 17, 735-740
17. Cao, J.; Wang, Q.; Dai, H. Nat. Mater. 2005, 4, 745-749
18. Deng, Z.; Yenilmez, E.; Leu, J.; Hoffman, J. E.; Straver, E. W. J.; Dai, H.; Moler, K. A. App. Phys. Lett. 2004, 85, 6263-6265
19. Hong, G.; Tabakman, S. M.; Welsher, K.; Wang, H.; Wang, X.; Dai, H. J. Am. Chem. Soc. 2010, 132, 15920-15923