An ice lithography instrument

Review of Scientific Instruments

Volumn 82, Issue 6, 2011, Pages

  Han, Anpan ^a   Chervinsky, John ^a   Branton, Daniel ^b   Golovchenko, J A ^a  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; CRYOGENIC SYSTEM; E-BEAM LITHOGRAPHY; HIGH THROUGHPUT; HIGH VACUUM; ICE LITHOGRAPHY; ISO-PROPANOLS; METAL DEPOSITION; NANO SCALE; NANO-DEVICE FABRICATION; NANOPATTERNING; NANOSCALE METALS; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPES; THERMAL FIELD EMISSIONS; VACUUM CHAMBERS; VACUUM SYSTEM;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; INSTRUMENTS; METALS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; VACUUM; WATER VAPOR;

ICE;

ICE; METAL;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; INSTRUMENTATION; PRINTING; VOLATILIZATION;

EQUIPMENT DESIGN; ICE; METALS; PRINTING; VOLATILIZATION;

EID: 79960193984     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3601005     Document Type: Article

References (4)

1. G. M. King, G. Schurmann, D. Branton, and J. A. Golovchenko, Nano Lett. 5, 1157 (2005). 10.1021/nl050405n (Pubitemid 40925433)
2. A. Han, D. Vlassarev, J. Wang, J. A. Golovchenko, and D. Branton, Nano Lett. 10, 5066 (2010). 10.1021/nl1032815
3. J. Cao, Q. Wang, D. Wang, and H. Dai, Small 1, 138 (2005). 10.1002/smll.200400015 (Pubitemid 43951818)
4. J. Cao, Q. Wang, and H. Dai, Nature Mater. 4, 745 (2005). 10.1038/nmat1478 (Pubitemid 41397020)