Plasma processing of nanomaterials: Emerging technologies for sensing and energy applications

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8206-8213

  Gasparotto, Alberto ^a   Barreca, Davide ^a   Bekermann, Daniela ^a   Devi, Anjana ^b   Fischer, Roland A ^b   MacCato, Chiara ^a   Tondello, Eugenio ^a  

^a UNIVERSITY OF PADOVA   (Italy)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Co 3O 4 nanomaterials; Gas sensing; Hydrogen photo production; PE CVD; Plasma processing

Indexed keywords

ACTIVATION MECHANISMS; ADVANCED TECHNOLOGY; CVD PROCESS; EMERGING APPLICATIONS; EMERGING TECHNOLOGIES; ENERGY APPLICATIONS; GAS SENSING; MATERIAL PROPERTY; MULTI-FUNCTIONAL; NANOARCHITECTURES; NONEQUILIBRIUM PLASMAS; SOLID STATE GAS SENSORS; SYNTHESIS CONDITIONS; UNIQUE FEATURES;

GAS SENSING ELECTRODES; HYDROGEN; HYDROGEN PRODUCTION; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; PLASMA DEVICES;

CHEMICAL VAPOR DEPOSITION;

EID: 84856854953     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5023     Document Type: Conference Paper

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