Self-assembled low-dimensional nanomaterials via low-temperature plasma processing

Thin Solid Films

Volumn 516, Issue 19, 2008, Pages 6609-6615

  Ostrikov, K ^a   Levchenko, I ^a   Xu, S ^b   Huang, S Y ^b   Cheng, Q J ^b   Long, J D ^b   Xu, M ^c  

^a UNIVERSITY OF SYDNEY   (Australia)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c SICHUAN UNIVERSITY   (China)

Author keywords

Low dimensional semiconductors; Nanoparticles; Nanostructures; Nanowires; Plasma nanofabrication

Indexed keywords

ASPECT RATIO; CADMIUM; DIMENSIONAL STABILITY; ELECTRIC WIRE; INDUCTIVELY COUPLED PLASMA; ION EXCHANGE; MAGNETRON SPUTTERING; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; PHOTORESISTS; PLASMA (HUMAN); PLASMAS; PULSED LASER DEPOSITION; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILICON; SPUTTER DEPOSITION; SURFACE DIFFUSION; SURFACES; ZINC OXIDE; ZINC SULFIDE;

(1 1 0) SURFACE; (2+1)-DIMENSIONAL; (I ,J) CONDITIONS; CADMIUM SULFIDE (CDS); COUPLED PLASMAS; CRYSTALLINITY; ELSEVIER (CO); GROWTH SURFACES; ION FLUXES; LOCAL ENERGIES; LOW TEMPERATURE PLASMA (LTP); NANO MATERIALS; NANO-MATERIALS; PLASMA AIDED NANOFABRICATION; RF MAGNETRON SPUTTERING; SELF-ASSEMBLED; SI NANOWIRES; ULTRA HIGH; VERTICALLY ALIGNED; ZNO NANO-PARTICLES;

PLASMA DEPOSITION;

EID: 45449110442     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.045     Document Type: Article

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