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Volumn 3, Issue 11, 2011, Pages 4632-4639

Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes

(12) Ingrosso, Chiara a Martin Olmos, Cristina b,c Llobera, Andreu b Innocenti, Claudia d Sangregorio, Claudio d,e Striccoli, Marinella a Agostiano, Angela a Voigt, Anja f Gruetzner, Gabi f Brugger, Jürgen c Perez Murano, Francesc b Curri, Maria Lucia a

a UNIVERSITY OF BARI (Italy)

b CSIC (Spain)

c EPFL (Switzerland)

d UNIVERSITY OF FLORENCE (Italy)

e CNR (Italy)

f MICRO RESIST TECHNOLOGY GMBH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

3D MICROSTRUCTURES; AFM PROBE; HIGH ASPECT RATIO; HIGH QUALITY FACTORS; HIGH-RESOLUTION IMAGING; MATRIX; MECHANICAL DEVICE; MECHANICAL RESPONSE; NEGATIVE TONES; OXIDE NANOCRYSTALS; POLYMER BASED; PURE EPOXY;

ASPECT RATIO; CRYSTAL ATOMIC STRUCTURE; EMBEDDED SYSTEMS; MECHANICAL PROPERTIES; NANOCOMPOSITES; NANOCRYSTALS; PHOTORESISTS; POLYMERS; PROBES; STIFFNESS MATRIX;

ATOMIC FORCE MICROSCOPY;

FERRIC ION; FERRIC OXIDE; NANOMATERIAL; PLASTIC;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; IMAGE ENHANCEMENT; INSTRUMENTATION; MATERIALS TESTING; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; FERRIC COMPOUNDS; IMAGE ENHANCEMENT; MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PLASTICS;

EID: 84856425404 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c1nr10487j Document Type: Article

Times cited : (8)

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