SU-8 nanocomposite photoresist with low stress properties for microfabrication applications

Microelectronic Engineering

Volumn 83, Issue 10, 2006, Pages 1966-1970

  Jiguet, Sébastien ^a   Bertsch, Arnaud ^a   Judelewicz, Moshe ^b   Hofmann, Heinrich ^a   Renaud, Philippe ^a  

^a EPFL   (Switzerland)

^b Gersteltec Sarl   (Switzerland)

Author keywords

Microfabrication; Nanocomposite; Silica; SU 8

Indexed keywords

COMPOSITE STRUCTURES; CRACKS; EPOXY RESINS; PHOTORESISTORS; SILICA; STRESSES; COMPOSITE MATERIALS; NANOSTRUCTURED MATERIALS; PHOTOSENSITIVITY;

MICROFABRICATION; NANOCOMPOSITE; PHOTOPATTERNED COMPOSITE STRUCTURES; SU-8; SU-8 NANOCOMPOSITE PHOTORESIST;

NANOSTRUCTURED MATERIALS; PHOTORESISTS;

EID: 33746895166     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.02.004     Document Type: Article

References (16)

1. R.A. Day, J.D. Gelorme, D.A. Russell, S.J. Witt, US-5304457, 1994.
2. Heuschkel M.O., Guérin L.J., Buisson B., Bertrand D., and Renaud P. Sensor. Actuator.: B Chem. 48 (1998) 356
3. Lorenz H., Despont M., Fahrni N., LaBianca N., Renaud P., and Vettiger P. J. Micromech. Microeng. 7 (1997) 121
4. Feng R., and Farris R.J. J. Micromech. Microeng. (2003) 80
5. Mauger M., Dubault A., and Halary J.L. Polym. Int. 53 (2004) 378
6. Kim H.K., Kim J.G., Cho J.D., and Hong J.W. Polym. Test. 22 (2003) 899
7. Gonsalves K.E., Merhari L., Wu H., and Hu Y. Adv. Mater. 13 (2001) 703
8. Griffith M.L., and Halloran J.W. J. Am. Ceram. Soc. 79 (1996) 2601
9. Baikerikar K.K., Sipani V., Coretsopoulos C.N., and Scranton A.B. In: belfield K.D., and Crivello J.V. (Eds). Photopolymerization of Silica-filled Composites: Encapsulants for Microelectronic Devices vol. 847 (2003), The American Chemical Society, USA
10. Zhou S., Wu L., Sun J., and Shen W. Prog. Org. Coat. 45 (2002) 33
11. Bauer F., Gläsel H.J., Decker U., Ernst H., Freyer A., Hatmann E., Sauerland V., and Mehnert R. Prog. Org. Coat. 47 (2003) 147
12. Morgan A.B., Antonucci J.M., VanLandingham M.R., Harris R.H., and Kashiwagi T. Polym. Mater. Sci. Eng. 83 (2000) 57
13. Griffith M.L., and Halloran J.W. J. Appl. Phys. 81 (1997) 2538
14. Rai-Choudhury P. Handbook of Microlithography, Micromachining, and Microfabrication vol. 1 (1997), SPIE Press, USA
15. Reiser A. Photoreactive Polymers: The Science and Technology of Resists (1989), John Wiley & Sons, New York
16. Apetz R., and van Bruggen M.P.B. J. Am. Ceram. Soc. 86 (2003) 480