Strong amorphization of high-entropy AlBCrSiTi nitride film

Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2613-2618

  Tsai, Che Wei ^a   Lai, Sih Wei ^a   Cheng, Keng Hao ^a   Tsai, Ming Hung ^a   Davison, Andrew ^a   Tsau, Chun Huei ^b   Yeh, Jien Wei ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b CHINESE CULTURE UNIVERSITY   (Taiwan)

Author keywords

Amorphous structure; High entropy alloy; Nitride film

Indexed keywords

ALTERNATIVE APPROACH; AMORPHOUS COATING; AMORPHOUS STRUCTURES; ANNEALING TEMPERATURES; CHEMICAL FORMULAE; DEPOSITION TEMPERATURES; DIFFERENT SUBSTRATES; DIFFUSION EFFECTS; ENTROPY EFFECTS; FACE-CENTERED CUBIC; GRAIN SIZE; HIGH THERMAL STABILITY; HIGH-ENTROPY ALLOY; IN-VACUUM; LATTICE DISTORTIONS; NITRIDE COATING; NITRIDE FILM; NITRIDE FILMS; NITROGEN CONCENTRATIONS; NITROGEN FLOW; TARGET ELEMENT; TRANSMISSION ELECTRON MICROSCOPE; X RAY DIFFRACTOMETERS;

AMORPHOUS SILICON; ANNEALING; ATMOSPHERIC TEMPERATURE; COATINGS; ENTROPY; MOLYBDENUM; NITROGEN; POLYCRYSTALLINE MATERIALS; SODIUM CHLORIDE; TITANIUM NITRIDE; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; ZIRCONIUM;

AMORPHOUS FILMS;

EID: 84856396186     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.11.025     Document Type: Article

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