Nitride films deposited from an equimolar Al-Cr-Mo-Si-Ti alloy target by reactive direct current magnetron sputtering

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 6402-6408

  Chang, Hui Wen ^a   Huang, Ping Kang ^a   Davison, Andrew ^a   Yeh, Jien Wei ^a   Tsau, Chun Huei ^b   Yang, Chih Chao ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b CHINESE CULTURE UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

AlCrMoSiTi; Coating; Magnetron sputtering; Multi element; Nitride

Indexed keywords

EID: 44649173204     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.01.019     Document Type: Letter

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