A shift-tolerant dissimilarity measure for surface defect detection

IEEE Transactions on Industrial Informatics

Volumn 8, Issue 1, 2012, Pages 128-137

  Tsai, Du Ming ^a   Chiang, I Yung ^a   Tsai, Ya Hui ^b  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Defect detection; light emitting diode (LED) wafer inspection; machine vision; optical flow; surface inspection; template matching

Indexed keywords

DEFECT DETECTION; DISSIMILARITY MEASURES; IMAGE PAIRS; INTEGRAL IMAGES; NORMALIZED CROSS CORRELATION; OPTICAL FLOW COMPUTATION; PATTERNED SURFACE; PRODUCT VARIATIONS; RECOGNITION RATES; SURFACE INSPECTION; SWAPPING PROCESS; TEST SETS; VISUAL INSPECTION; WAFER DIES;

COMPUTER VISION; IMAGE MATCHING; INSPECTION; LIGHT EMISSION; OPTICAL DATA PROCESSING; OPTICAL FLOWS; SURFACE DEFECTS; TEMPLATE MATCHING;

LIGHT EMITTING DIODES;

EID: 84856328110     PISSN: 15513203     EISSN: None     Source Type: Journal    
DOI: 10.1109/TII.2011.2166797     Document Type: Article

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