메뉴 건너뛰기




Volumn 17, Issue 5, 2011, Pages 789-795

Effect of N 2 plasma treatment on the adhesion of Cu/Ni thin film to polyimide

Author keywords

Electrical electronic materials; Plasma treatment; Plating; Strength; Tensile test

Indexed keywords


EID: 84856284376     PISSN: 15989623     EISSN: 20054149     Source Type: Journal    
DOI: 10.1007/s12540-011-1015-1     Document Type: Article
Times cited : (25)

References (23)
  • 23
    • 84856247139 scopus 로고    scopus 로고
    • Ph. D. thesis, Korea Advance Institute of Science and Technology, Daejon
    • I. S. Park, Ph. D. thesis, Korea Advance Institute of Science and Technology, Daejon (1997).
    • (1997)
    • Park, I.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.