Effects of electron irradiation on the properties of GZO films deposited with RF magnetron sputtering

Applied Surface Science

Volumn 258, Issue 8, 2012, Pages 3903-3906

  Kim, Y S ^a   Heo, S B ^a   Lee, H M ^a   Lee, Y J ^a   Kim, I S ^a   Kang, M S ^a   Choi, D H ^b   Lee, B H ^b   Kim, M G ^b   Kim, Daeil ^a  

^a University of Ulsan   (South Korea)

^b Shinki Intetmobile LTD   (South Korea)

Author keywords

Electron irradiation; Figure of merit; GZO; Work function; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; ELECTRONS; MAGNETRON SPUTTERING; RADIATION; WORK FUNCTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FIGURE OF MERITS; OPTICAL AND ELECTRICAL PROPERTIES; POLYCARBONATE SUBSTRATES; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; TRANSPARENT CONDUCTIVE; UV PHOTOELECTRON SPECTROSCOPY; UV-VIS SPECTROPHOTOMETRY;

ELECTRON IRRADIATION;

EID: 84856228795     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.12.057     Document Type: Article

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