Single- and multi-scan femtosecond laser writing for selective chemical etching of cross section patternable glass micro-channels

Applied Physics A: Materials Science and Processing

Volumn 106, Issue 1, 2012, Pages 5-13

  Ho, Stephen ^a   Herman, Peter R ^a   Aitchison, J Stewart ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BURIED CHANNELS; CHEMICAL ETCHING; CROSS SECTION; CROSS SECTIONAL PROFILES; CROSS-SECTIONAL SHAPE; ETCH RATES; FEMTOSECOND LASER WRITING; LASER POWER; MICROFLUIDIC CHANNEL; MULTI-SCAN; SCANNING ANGLES; SCANNING SPEED; STRESS-INDUCED; VERTICAL WALL;

FLUIDIC DEVICES; FUSED SILICA; GLASS; GLASS LASERS; HYDROFLUORIC ACID; SURFACE ROUGHNESS; ULTRASHORT PULSES; WET ETCHING;

THREE DIMENSIONAL;

EID: 84856031636     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-011-6675-7     Document Type: Article

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