Influence of mesoporous substrate morphology on the structural, optical and electrical properties of RF sputtered ZnO layer deposited over porous silicon nanostructure

Applied Surface Science

Volumn 258, Issue 7, 2012, Pages 2283-2288

  Kumar, Yogesh ^a,c   Garcia, J Escorcia ^a   Singh, Fouran ^b   Olive Mendez S F ^c   Sivakumar, V V ^b   Kanjilal, D ^b   Agarwal, V ^a  

^a UNIVERSIDAD AUTÓNOMA DEL ESTADO DE MORELOS   (Mexico)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^c CENTRO DE INVESTIGACIÓN EN MATERIALES AVANZADOS   (Mexico)

Author keywords

Mesoporous templates; Morphology; Optical properties; Porous silicon; RF sputtering; Transport; Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; GRAIN GROWTH; II-VI SEMICONDUCTORS; MAGNETIC SEMICONDUCTORS; MESOPOROUS MATERIALS; MORPHOLOGY; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOLUMINESCENCE SPECTROSCOPY; PORE SIZE; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR JUNCTIONS; WIDE BAND GAP SEMICONDUCTORS; X RAY DIFFRACTION; ZINC OXIDE;

MESOPOROUS TEMPLATES; METAL-SEMICONDUCTOR JUNCTIONS; OPTICAL AND ELECTRICAL PROPERTIES; POROUS SILICON NANOSTRUCTURES; RF-SPUTTERING; SUBSTRATE MORPHOLOGIES; TRANSPORT; TRANSPORT CHARACTERISTICS;

SUBSTRATES;

EID: 84855523055     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.131     Document Type: Article

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