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Volumn 206, Issue 10, 2012, Pages 2667-2672

Effect of Hf on structure and age hardening of Ti-Al-N thin films

Author keywords

Ab initio; Oxidation; Ti Al Hf N; Ti Hf n; TiAlHfN; TiAlN

Indexed keywords

AB INITIO; AB INITIO PREDICTION; ADDITIONAL ANNEALING; ALN; CUBIC MODIFICATIONS; DECOMPOSITION PRODUCTS; FILM HARDNESS; FORMATION TEMPERATURE; FREE FILMS; HIGH TEMPERATURE; HIGHER TEMPERATURES; ISOSTRUCTURAL; MECHANICAL AND THERMAL PROPERTIES; MILLING OPERATION; RAPID REDUCTION; SUB-LATTICES; THERMALLY ACTIVATED DIFFUSION; TI-AL-HF-N; TI-HF-N; TIALN; VACUUM-ANNEALING; WORK LOADS; WURTZITES;

EID: 84855287351     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.11.020     Document Type: Article
Times cited : (59)

References (39)
  • 33
    • 84855277423 scopus 로고    scopus 로고
    • JCPDS Card No. 01-076-0702.
    • JCPDS Card No. 01-076-0702.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.