A study of the critical factor determining the size of etched latent tracks formed on SiO 2 glass by swift-Cl-ion irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 272, Issue , 2012, Pages 1-4

  Nomura, Ken Ichi ^a,b   Ohki, Yoshimichi ^a   Fujimaki, Makoto ^b   Wang, Xiaomin ^a,b   Awazu, Koichi ^b   Komatsubara, Tetsuro ^c  

^a WASEDA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Etching; Heat diffusion equation; Latent track; Nanopore; SiO 2 glass; Swift heavy ion

Indexed keywords

CRITICAL FACTORS; HEAT DIFFUSION EQUATIONS; ION ENERGIES; LATENT TRACKS; SWIFT HEAVY IONS;

ETCHING; HYDROFLUORIC ACID; IRRADIATION; NANOPORES; PARTIAL DIFFERENTIAL EQUATIONS; SILICON COMPOUNDS;

GLASS;

EID: 84655168051     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.01.020     Document Type: Conference Paper

References (21)

1. X. Wang, M. Fujimaki, and K. Awazu Opt. Express. 13 2005 1486
2. U. Schulz, P. Munzert, R. Leitel, I. Wendling, N. Kaiser, and A. Tünnermann Opt. Express. 15 2007 13108
3. J. Vieillard, R. Mazurczyk, L.L. Boum, A. Bouchard, Y. Chevolot, P. Cremillieu, B. Hannes, and S. Krawczyk Microelectron. Eng. 85 2008 465
4. S. Norasetthekul, P.Y. Park, K.H. Baik, K.P. Lee, J.H. Shin, B.S. Jeong, V. Shishodia, E.S. Lambers, D.P. Norton, and S.J. Pearton Appl. Surf. Sci. 185 2001 27
5. C. Trautmann, W. Brüchle, R. Spohr, J. Vetter, and N. Angert Nucl. Instrum. Methods Phys. Res. B 111 1996 70
6. P. Apel, A. Schulz, R. Spohr, C. Trautmann, and V. Vutsadakis Nucl. Instrum. Methods Phys. Res. B 146 1998 468
7. K. Awazu, S. Ishii, K. Shima, S. Roorda, and J.L. Brebner Phys. Rev. B 62 2000 3689
8. D. Dobrev, J. Vetter, R. Neumann, and N. Angert J. Vac. Sci. Technol. B 19 2001 1385
9. R.G. Musket, J.M. Yoshiyama, R.J. Contolini, and J.D. Porter J. Appl. Phys. 91 2002 5760
10. M. Fujimaki, C. Rockstuhl, X. Wang, K. Awazu, J. Tominaga, T. Ikeda, Y. Ohki, and T. Komatsubara Microelectron. Eng. 84 2007 1685
11. A. Dallanora, T.L. Marcondes, G.G. Bermudez, P.F.P. Fichtner, C. Trautmann, M. Toulemonde, and R.M. Papaléo J. Appl. Phys. 104 2008 024307
12. K. Nomura, Y. Ohki, M. Fujimaki, X. Wang, K. Awazu, and T. Komatsubara Nanotechnology 20 2009 475306
13. K. Awazu, X. Wang, M. Fujimaki, T. Komatsubara, T. Ikeda, and Y. Ohki J. Appl. Phys. 100 2006 044308
14. M. Toulemonde, J.M. Costantini, C. Dufour, A. Meftah, E. Paumier, and F. Studer Nucl. Instrum. Methods Phys. Res. B 116 1996 37
15. K. Awazu, X. Wang, M. Fujimaki, J. Tominaga, H. Aiba, Y. Ohki, and T. Komatsubara Phys. Rev. B 78 2008 054102
16. J. Jensen, A. Razpet, M. Skupiński, and G. Possnert Nucl. Instrum. Methods Phys. Res. B 243 2006 119
17. Available from: .
18. B. Marler Phys. Chem. Miner. 16 1988 286
19. M.P.R. Waligorski, R.N. Hamm, and R. Katz Nucl. Tracks Radiat. Meas. 11 1986 309
20. K. Nomura, T. Nakanishi, Y. Nagasawa, Y. Ohki, K. Awazu, M. Fujimaki, N. Kobayashi, S. Ishii, and K. Shima Phys. Rev. B 68 2003 064106
21. A. Meftah, F. Brisard, J.M. Costantini, M. Hage-Ali, J.P. Stoquert, F. Studer, and M. Toulemonde Phys. Rev. B 48 1993 920