Twelve nanometer half-pitch W-Cr-HSQ trilayer process for soft x-ray tungsten zone plates

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Reinspach, Julia ^a   Uhlén, Fredrik ^a   Hertz, Hans M ^a   Holmberg, Anders ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION EFFICIENCY; DIFFRACTION GRATINGS; EFFICIENCY; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; PLATES (STRUCTURAL COMPONENTS); SODIUM CHLORIDE;

ETCH PROFILE; HALF PITCHES; HIGH CONTRAST; HIGH RESOLUTION; NANOFABRICATION PROCESS; OPTIMIZED PROCESS; SUBSTRATE TEMPERATURE; ZONE PLATE LENS;

X RAYS;

EID: 84255172356     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3643760     Document Type: Article

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