Growth of graphene on Cu by plasma enhanced chemical vapor deposition

Carbon

Volumn 50, Issue 3, 2012, Pages 869-874

  Terasawa, Tomo O ^a   Saiki, Koichiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOWALLS; CU SUBSTRATE; GAS PRESSURES; GROWTH MECHANISMS; HIGH SUBSTRATE TEMPERATURE; LOW TEMPERATURES; PLASMA POWER; SUBSTRATE TEMPERATURE;

CHEMICAL VAPOR DEPOSITION; GRAPHENE; MONOLAYERS; PLASMA DEPOSITION; PLASMAS; SUBSTRATES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 84155170971     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.09.047     Document Type: Article

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