Property study of aluminium oxide thin films by thermal annealing

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 9, Issue 1, 2012, Pages 77-80

  Zhao, Zhiwei ^a   Tay, Beng Kang ^b  

^a SOUTHEAST UNIVERSITY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Aluminium oxide; Annealing; Optical dispersion

Indexed keywords

ALUMINIUM OXIDE; ANNEALING EFFECTS; ANNEALING TEMPERATURES; DISPERSION ENERGIES; DISPERSION PARAMETERS; FILTERED CATHODIC VACUUM ARC; FREQUENCY DISPERSION; OPTICAL DISPERSION; OSCILLATOR STRENGTHS; OXYGEN PARTIAL PRESSURE; ROOM TEMPERATURE; SINGLE OSCILLATORS; SINGLE-OSCILLATOR MODEL; THERMAL-ANNEALING;

ALUMINUM; ANNEALING; DISPERSION (WAVES); DISPERSIONS; OXIDES; REFRACTIVE INDEX; THIN FILMS; VACUUM APPLICATIONS;

OXIDE FILMS;

EID: 83755185563     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201084181     Document Type: Article

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