Dynamic mixing deposition of niobium nitride films by cathodic arc plasma in ambient nitrogen

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2048-2050

  Zhang, T ^a,b   Song, J H ^a   Tian, X B ^a   Chu, P K ^a   Brown, I G ^c  

^a BEIJING NORMAL UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; DEPOSITION; HIGH TEMPERATURE OPERATIONS; IONS; MIXING; NIOBIUM COMPOUNDS; NITROGEN; PLASMA APPLICATIONS; SUBSTRATES;

CATHODIC ARC PLASMA DEPOSITION; DYNAMIC MIXING;

SEMICONDUCTING FILMS;

EID: 0035440004     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1372896     Document Type: Article

References (15)