Growth rate of silicon nanowires

Applied Physics Letters

Volumn 86, Issue 12, 2005, Pages 1-3

  Kikkawa, J ^a   Ohno, Y ^a   Takeda, S ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; NANOSTRUCTURED MATERIALS; SILANES; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY;

FLOW RATE; HEATER CURRENTS; SILICON NANOWIRES; VAPOR PHASE REACTANTS;

SILICON;

EID: 17944376542     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1888034     Document Type: Article

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