Influence of oxygen flow rate on microstructural, electrical and optical properties of indium tin tantalum oxide films

Materials Science in Semiconductor Processing

Volumn 13, Issue 5-6, 2010, Pages 411-416

  Zhang, Bo ^a  

^a Changzhou Institute of Mechatronic Technology   (China)

Author keywords

Electrical properties; ITO films; Optical band gap; Optical properties

Indexed keywords

COSPUTTERING; CRYSTALLINE STRUCTURE; ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; INDIUM TIN OXIDE; INFLUENCE OF OXYGEN; ITO FILMS; MICRO-STRUCTURAL; NEAR-IR; OPTICAL BANDS; OXYGEN FLOW RATES; SPUTTERING TECHNOLOGY; VISIBLE LIGHT;

CARRIER CONCENTRATION; CHEMICAL STABILITY; ELECTRIC PROPERTIES; ENERGY GAP; FLOW RATE; INDIUM; INDIUM COMPOUNDS; ITO GLASS; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; SEMICONDUCTOR DOPING; SUBSTRATES; SURFACE ROUGHNESS; TANTALUM; TANTALUM OXIDES; TIN; TIN OXIDES; TINNING;

OPTICAL FILMS;

EID: 82455210927     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2011.10.004     Document Type: Article

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