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Volumn 32, Issue 12, 2011, Pages 1683-1685

N-Polar GaN/AlN MIS-HEMT with fMAX of 204 GHz for Ka-Band applications

Author keywords

Digital doping; GaN spacer; Metal insulator semiconductor high electron mobility transistor (MIS HEMT); Millimeter wave power; N polar GaN

Indexed keywords

ALLOY SCATTERING; ALN; GAN SPACER; HIGH OUTPUT POWER; KA BAND; LARGE-SIGNALS; LINEAR TRANSDUCERS; LOW-OHMIC CONTACT; METAL-INSULATOR-SEMICONDUCTORS; MILLIMETER-WAVE POWER; MIS-HEMT; N-POLAR GAN; POWER GAINS; POWER-ADDED EFFICIENCY;

EID: 81855217354     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2011.2168558     Document Type: Article
Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.