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Volumn 269, Issue 24, 2011, Pages 3021-3024
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Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer
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Author keywords
Al2O3 and TiO 2; ALD; Depth profiling; ERD; Nanolaminate; ToF ERDA
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Indexed keywords
ALD;
DEPTH PROFILE;
ELASTIC RECOIL DETECTION ANALYSIS;
ENERGY SPECTROMETER;
ERD;
LAYER THICKNESS;
NANO-LAMINATES;
NANOLAMINATE;
NANOLAMINATE FILMS;
SINGLE LAYER;
TIME OF FLIGHT;
TIO;
TOF-ERDA;
ALUMINUM;
ATOMIC LAYER DEPOSITION;
COPPER;
DEPOSITION;
ELECTRIC PROPERTIES;
MECHANICAL PROPERTIES;
SPECTROMETERS;
SPECTROMETRY;
SURFACE ROUGHNESS;
THIN FILMS;
TITANIUM DIOXIDE;
VAPOR DEPOSITION;
DEPTH PROFILING;
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EID: 81855194090
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2011.04.074 Document Type: Conference Paper |
Times cited : (14)
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References (21)
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