Analysis of crosstalk in single- and multiwall carbon nanotube interconnects and its impact on gate oxide reliability

IEEE Transactions on Nanotechnology

Volumn 10, Issue 6, 2011, Pages 1362-1370

  Das, Debaprasad ^a,b   Rahaman, Hafizur ^b  

^a MEGHNAD SAHA INSTITUTE OF TECHNOLOGY   (India)

^b INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

Author keywords

Average failure rate (AFR); carbon nanotube (CNT); crosstalk; failure in time (FIT); gate oxide reliability; multiwall CNT (MWCNT); single wall CNT (SWCNT)

Indexed keywords

FAILURE RATE; FAILURE-IN-TIME; GATE OXIDE RELIABILITY; MULTI-WALL CNT; SINGLE-WALL;

CARBON; CROSSTALK; ELECTRIC NETWORK ANALYSIS; MULTIWALLED CARBON NANOTUBES (MWCN); RELIABILITY ANALYSIS; SINGLE-WALLED CARBON NANOTUBES (SWCN); VLSI CIRCUITS;

GATES (TRANSISTOR);

EID: 81255144185     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2011.2146271     Document Type: Article

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