The Atmospheric Scanning Electron Microscope with open sample space observes dynamic phenomena in liquid or gas

Ultramicroscopy

Volumn 111, Issue 12, 2011, Pages 1650-1658

  Suga, Mitsuo ^a   Nishiyama, Hidetoshi ^a   Konyuba, Yuji ^a   Iwamatsu, Shinnosuke ^b   Watanabe, Yoshiyuki ^b   Yoshiura, Chie ^c   Ueda, Takumi ^c   Sato, Chikara ^d  

^a JEOL LTD   (Japan)

^b YAMAGATA RESEARCH INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

ASEM; Dynamic observation; Electrochemistry; Metal paste; Self organization; SEM

Indexed keywords

ASEM; BACKSCATTERED ELECTRONS; DYNAMIC OBSERVATION; DYNAMIC PHENOMENA; EASE-OF-USE; ELECTROCHEMICAL DEPOSITION; HIGH RESOLUTION; HIGH THROUGHPUT; IMAGING SPEED; IN-VACUUM; INDUSTRIAL PROCESSS; INTERNAL VOIDS; METAL PASTE; MONITORING AND CONTROL; PRESSURE-RESISTANT; RADIATION-INDUCED; REAL TIME; SAMPLE SPACE; SCANNING ELECTRON MICROSCOPE; SELF ORGANIZATIONS; SELF-ORGANIZATION PROCESS; SILVER DEPOSITION; SILVER NITRATE SOLUTIONS; SILVER PASTES; SOLDER PASTE; VOLUME CHANGE;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CATHODES; ELECTROCHEMISTRY; ELECTRON BEAMS; PHASE TRANSITIONS; REDUCTION; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE;

LIQUIDS;

SILICON NITRIDE; SILVER; SILVER NITRATE;

ANALYTICAL EQUIPMENT; ARTICLE; ATMOSPHERIC PRESSURE; ATMOSPHERIC SCANNING ELECTRON MICROSCOPE; CRYSTALLIZATION; DETECTOR; DYNAMICS; ELECTROCHEMISTRY; ELECTRON; ELECTRON BEAM; EVAPORATION; FILM; GAS; HEAT TREATMENT; IMAGING; LIQUID; MELTING POINT; PHYSICAL CHEMISTRY; PRESSURE GRADIENT; PROCESS MONITORING; RADIATION RESPONSE; SCANNING ELECTRON MICROSCOPE; TEMPERATURE DEPENDENCE; THICKNESS; VELOCITY;

EID: 81055138982     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.08.001     Document Type: Article

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