Sputter coated nanocrystalline ZnO for fabrication of thin film transistors

IEEE International Conference on Electro Information Technology

Volumn , Issue , 2011, Pages

  Kopparthi, Nikilesh ^a   Gautam, Madhav ^a   Jayatissa, Ahalapitiya H ^b  

^a Toledo   (United States)

^b UNIVERSITY OF TOLEDO   (United States)

Author keywords

Lithography; Oxide; RF Sputtering; Thin film Transistors

Indexed keywords

BOTTOM GATE; CHANNEL MOBILITY; ELECTRICAL CHARACTERISTIC; ELECTRICAL CHARACTERIZATION; ELECTRONIC DEVICE; FABRICATION OF THIN FILMS; GOLD CONTACTS; HIGH MOBILITY; LIFT-OFF PROCESS; METAL EVAPORATION; NANOCRYSTALLINE ZNO; NORMALLY ON; ON/OFF RATIO; PHOTO EFFECT; PREFERRED ORIENTATIONS; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; ROOM TEMPERATURE; THERMALLY OXIDIZED SILICON; ZNO FILMS; ZNO LAYERS;

DIAGNOSTIC RADIOGRAPHY; FABRICATION; FLAT PANEL DISPLAYS; FLEXIBLE ELECTRONICS; MAGNETRON SPUTTERING; NANOCRYSTALLINE SILICON; PHOSPHORUS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; THIN FILM DEVICES; THRESHOLD VOLTAGE; X RAY DIFFRACTION; ZINC OXIDE;

THIN FILM TRANSISTORS;

EID: 80155131220     PISSN: 21540357     EISSN: 21540373     Source Type: Conference Proceeding    
DOI: 10.1109/EIT.2011.5978589     Document Type: Conference Paper

References (18)

1. Heo, Y. W., Tien, L. C., Kwon, Y., Norton, D. P., Pearton, S. J., Kang, B. S., Ren, F., "Depletion-mode ZnO nanowire field-effect transistor", Applied Physics Letters, Volume 85, Issue 12, 2274 (2004).
2. Dimitrakopoulos, C. D., Purushothaman, S., Kymissis, J., Callegari, A. and Shaw, J. M., "Low-Voltage Organic Transistors on Plastic Comprising High-Dielectric Constant Gate Insulators" Science Vol. 283 no. 5403 pp. 822-824 (1999).
3. Crone, A. B., Dodabalapur, A., Y.-Y. Lin1, R. W. Filas1, Z. Bao1, A. LaDuca2, R. Sarpeshkar1,3, H. E. Katz1 & W. Li1 "Large-scale complementary integrated circuits based on organic transistors", Nature 403, 521-523 (2000).
4. Lee, K., Kim, K., Lee, Kwang H., Lee, G., Oh, M. S., Choi, J. M., Im, S., Jang, S., et. al., "ZnO-based low voltage inverter with low-k/high-k double polymer dielectric layer", Applied Physics Letters, Vol. 93, pp. 193514-193514-3 (2008).
5. Navamathavan, R., Choi, C. K., Yang, E., Lim, J. H., Hwang, D. K., Park, S. J., "Fabrication and characterizations of ZnO thin film transistors prepared by using radio frequency magnetron sputtering", Solid State Electronics, Vol. 52, pp. 813-816 (2008).
6. Carcia, P. F., McLean, R. S., Reilly, M. H. and Nunes, G. Jr., "Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering", Applied Physics Letters, Vol 82, No 7, (2003).
7. Yonenaga, I., Koizumi, H., Ohno, Y., Taishi, T., "High-temperature strength and dislocation mobility in the wide band-gap ZnO: Comparison with various semiconductors", Journal of Applied Physics, Vol. 103, Issue: 9, pp. 093502-093502-4 (2008).
8. Tominaga, K., Umezu, N., Mori, I, Ushiro, T., Moriga, T., Nakabayashi, I., "Transparent conductive ZnO film preparation by alternating sputtering of ZnO:Al and Zn or Al targets", Thin Solid Films, Vol. 334, Issue: 1-2, pp. 35-39 (2008)
9. Ting, J. M., Lin, C. K., "Characteristics of Transparent Conducting Nano-Scaled Thin Films Based on ZnO", Journal of the American Ceramic Society, Vol. 89, pp. 3676-3680 (2006).
10. Kumar, M., Kar, J. P., Kim, I. S., Choi, S. Y., Myoung, J. M., "Fabrication of As-doped p-type ZnO thin film and ZnO nanowire inserted homojunction structure", Applied Physics A, Vol. 97, pp. 689-692 (2009).
11. Ding, R., Zhu, H., Zeng, Q., "Fabrication of p-type ZnO thin films via magnetron sputtering and phosphorus diffusion", Vacuum, Vol. 82, pp. 510-513 (2008).
12. Dai, L. P., Deng, H., Mao, F. Y., Zang, J. D., "The recent advances of research on p-type ZnO thin film", Journal of Materials Science: Materials in Electronics, Vol. 19, pp. 727 - 734 (2008).
13. Mondelaers D., Vanhoyland G., Van den Rul H., D'Haen J., Van Bael M. K., Mullens J. and Van Poucke L. C., "Chemical Solution Deposition of ZnO Thin Films by an Aqueous Solution Gel Precursor Route", JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY Volume 26, Numbers 1-3, 523-526.
14. Wang, Z.A.; Chu, J.B.; Zhu, H.B.; Sun, Z.; Chen, Y.W.; Huang, S.M., "Growth of ZnO:Al films by RF sputtering at room temperature for solar cell applications", Solid State Electronics, Vol. 53, pp. 1149-1153 (2009).
15. Gao W., Li Z., "ZnO thin films produced by magnetron sputtering", Ceramics International, Vol. 30, pp.1155-1159 (2004).
16. A. H. Jayatissa, Semiconductor Sci. and Tech., Vol. 18, pp. L27 (2003).
17. Soleimanpour A. M. and Jayatissa A. H., "Effect of UV irradiation on gas sensing behavior of nanocrystalline ZnO thin films", Nanotech. Materials and Device Conference (NMDC), IEEE, (2010).
18. Yoshio N., Robert D., "Handbook of Semiconductor Manufacturing Technology", Marcel Dekker Inc., pp 889 - 936, (2000).