EUV light source by high power laser

Journal of Physics: Conference Series

Volumn 112, Issue Part 4, 2008, Pages

  Izawa, Y ^a   Nishihara, K ^a   Tanuma, H ^b   Sasaki, A ^c   Murakami, M ^a   Sunahara, A ^d   Nishimura, H ^a   Fujioka, S ^a   Aota, T ^a   Shimada, Y ^d   Yamaura, M ^d   Nakatsuka, M ^a   Fujita, H ^a   Tsubakimoto, K ^a   Yoshida, H ^a   Miyanaga, N ^a   Mima, K ^a  

^a OSAKA UNIVERSITY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d INSTITUTE FOR LASER TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FUSION REACTIONS; HIGH POWER LASERS; INERTIAL CONFINEMENT FUSION; LASER FUSION; LASER PRODUCED PLASMAS; LIGHT SOURCES; PLASMA INTERACTIONS; ULTRAVIOLET DEVICES;

EUV LIGHT SOURCES; HIGH POWER; HIGH-POWER LASER SYSTEMS; LASER PLASMA; LASER-PRODUCED TIN PLASMAS; LITHOGRAPHY SYSTEMS; OPTIMUM CONDITIONS; RECENT PROGRESS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 84996551339     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/112/4/042047     Document Type: Conference Paper

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