메뉴 건너뛰기




Volumn 7636, Issue , 2010, Pages

Analysis, simulation, and experimental studies of YAG and CO2 laser-produced plasma for EUV lithography sources

Author keywords

CO2 Laser; Debris mitigation; DPP; EUV; HEIGHTS; LPP

Indexed keywords

COLLECTION SYSTEMS; DEBRIS GENERATION; DEBRIS MITIGATION; DENSITY VALUE; DISCHARGE-PRODUCED PLASMAS; EUV LITHOGRAPHY; EUV RADIATION; EUV SOURCE; EXPERIMENTAL FACILITIES; EXPERIMENTAL STUDIES; HIGH REFLECTIVITY; HIGH VOLUME MANUFACTURING; HIGH-POWER; LASER SYSTEMS; LPP SOURCES; ND : YAG LASERS; PLASMA PLUMES; PLASMA PROPERTIES; TARGET PARAMETER; TEMPORAL PROFILE; YAG;

EID: 77953459472     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848222     Document Type: Conference Paper
Times cited : (20)

References (11)
  • 2
    • 71949128381 scopus 로고    scopus 로고
    • Influence of spot size on extreme ultraviolet efficiency of laser-produced Sn plasmas
    • Harilal, S. S., Coons, R. W., Hough, P., and Hassanein, A., "Influence of spot size on extreme ultraviolet efficiency of laser-produced Sn plasmas," Applied Physics Letters 95, 221501 (2009).
    • (2009) Applied Physics Letters , vol.95 , pp. 221501
    • Harilal, S.S.1    Coons, R.W.2    Hough, P.3    Hassanein, A.4
  • 3
    • 70349906944 scopus 로고    scopus 로고
    • Effects of Plasma Spatial Profile on Conversion efficiency of Laser-Produced Plasma Sources for EUV lithography
    • Hassanein, A., Sizyuk, V., Sizyuk, T., and Harilal, S. S., "Effects of Plasma Spatial Profile on Conversion efficiency of Laser-Produced Plasma Sources for EUV lithography," J. Micro/Nanolith. MEMS MOEMS 8, 041503 (2009).
    • (2009) J. Micro/Nanolith. MEMS MOEMS , vol.8 , pp. 041503
    • Hassanein, A.1    Sizyuk, V.2    Sizyuk, T.3    Harilal, S.S.4
  • 4
    • 46049111206 scopus 로고    scopus 로고
    • Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse
    • Tao, Y., Tillack, M. S., Sequoia, K. L., Burdt, R. A., Yuspeh, S., and Najmabadi, F., "Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse," Applied Physics Letters 92, 251501 (2008).
    • (2008) Applied Physics Letters , vol.92 , pp. 251501
    • Tao, Y.1    Tillack, M.S.2    Sequoia, K.L.3    Burdt, R.A.4    Yuspeh, S.5    Najmabadi, F.6
  • 7
    • 77953455488 scopus 로고    scopus 로고
    • Comparison of EUV spectral and ion emission features from laser-produced Sn and Li plasmas
    • Coons, R. W., Campos, D., Crank, M., Harilal, S. S., and Hassanein, A., "Comparison of EUV spectral and ion emission features from laser-produced Sn and Li plasmas", these proceedings.
    • Proc. of SPIE
    • Coons, R.W.1    Campos, D.2    Crank, M.3    Harilal, S.S.4    Hassanein, A.5
  • 8
    • 77953367541 scopus 로고    scopus 로고
    • Multidimensional simulation and optimization of hybrid laser and discharge plasma devices for EUV lithography
    • Hassanein, A., Sizyuk, V., and Sizyuk, T., "Multidimensional simulation and optimization of hybrid laser and discharge plasma devices for EUV lithography," Proc. of SPIE 6921, 92113 (2008).
    • (2008) Proc. of SPIE , vol.6921 , pp. 92113
    • Hassanein, A.1    Sizyuk, V.2    Sizyuk, T.3
  • 9
    • 30344457058 scopus 로고    scopus 로고
    • Numerical simulation of laser-produced plasma devices for EUV lithography using the heights integrated model
    • DOI 10.1080/10407780500324996, PII N32058377832820
    • Sizyuk, V., Hassanein, A., Morozov, V., Tolkach, V., Sizyuk, T., and Rice, B., "Numerical simulation of laser-produced plasma devices for EUV lithography using the heights integrated model," Numerical Heat Transfer Part a-Applications 49, 215-236 (2006). (Pubitemid 43065434)
    • (2006) Numerical Heat Transfer; Part A: Applications , vol.49 , Issue.3 , pp. 215-236
    • Sizyuk, V.1    Hassanein, A.2    Morozov, V.3    Tolkach, V.4    Sizyuk, T.5    Rice, B.6
  • 10
    • 36849106512 scopus 로고
    • Correct values for high-frequency power absorption by inverse bremsstrahlung in plasmas
    • Johnston, T. W., and Dawson, J. M., "Correct values for high-frequency power absorption by inverse bremsstrahlung in plasmas," Phys. Fluids 16, 722 (1973).
    • (1973) Phys. Fluids , vol.16 , pp. 722
    • Johnston, T.W.1    Dawson, J.M.2
  • 11
    • 63649141412 scopus 로고    scopus 로고
    • Pulse shaping of transversely excited atmospheric CO2 laser using a simple plasma shutter
    • Hurst, N., and Harilal, S. S., "Pulse shaping of transversely excited atmospheric CO2 laser using a simple plasma shutter," Review of Scientific Instrumentation 80, 035101 (2009).
    • (2009) Review of Scientific Instrumentation , vol.80 , pp. 035101
    • Hurst, N.1    Harilal, S.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.