Light emission from Si nanoclusters formed at low temperatures

Applied Physics Letters

Volumn 88, Issue 10, 2006, Pages

  Pi, X D ^a,c   Zalloum, O H Y ^a   Roschuk, T ^a   Wojcik, J ^a   Knights, A P ^a   Mascher, P ^a   Simpson, P J ^b  

^a MCMASTER UNIVERSITY   (Canada)

^b UNIVERSITY OF WESTERN ONTARIO   (Canada)

^c University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN AMBIENT ANNEALING TEMPERATURE; HYDROGEN PASSIVATION; PARTIAL HYDROGENATION; REDSHIFT;

ANNEALING; LIGHT EMISSION; NUCLEATION; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

NANOSTRUCTURED MATERIALS;

EID: 33644919922     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2183813     Document Type: Article

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