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Volumn 520, Issue 1, 2011, Pages 294-301

Structural and surface energy analysis of nitrogenated ta-C films

(10) Rahman, Md Anisur a Soin, N a Maguire, P a D'Sa, R A a Roy, S S a,b Mahony, C M O a Lemoine, P a McCann, R a Mitra, S K b McLaughlin, J A D a

a UNIVERSITY OF ULSTER (United Kingdom)

b UNIVERSITY OF ALBERTA (Canada)

Author keywords

Surface energy; Surface roughness; Tetrahedral amorphous carbon (ta C); Thin films; Time of Flight Secondary Ion Mass Spectroscopy; Vacuum arc deposition

Indexed keywords

BULK PROPERTIES; CHEMICAL COMPOSITIONS; DISPERSIVE COMPONENTS; FILTERED CATHODIC VACUUM ARC; GEOMETRIC MEAN; N CONTENT; NITROGENATED TETRAHEDRAL AMORPHOUS CARBON (TA-C:N); PEAK POSITION; PEAK WIDTHS; POLAR COMPONENTS; RAMAN PARAMETERS; SURFACE ENERGIES; SURFACE ENERGY ANALYSIS; TA-C FILM; TETRAHEDRAL AMORPHOUS CARBON (TA-C); TIME-OF-FLIGHT SECONDARY ION MASS SPECTROSCOPY; TOF SIMS; TOTAL SURFACE ENERGY; VACUUM ARC DEPOSITION; XPS SPECTRA;

AMORPHOUS CARBON; ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; CONTACT ANGLE; DEIONIZED WATER; ENERGY MANAGEMENT; ETHYLENE; ETHYLENE GLYCOL; INTERFACIAL ENERGY; MASS SPECTROMETERS; METALLIC FILMS; PHOTOELECTRON SPECTROSCOPY; POLYMER BLENDS; RAMAN SPECTROSCOPY; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SURFACE CHEMISTRY; SURFACE ROUGHNESS; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; WATER CONTENT; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 80054035930 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.06.031 Document Type: Article

Times cited : (15)

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