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Materials Chemistry and Physics

Volumn 130, Issue 3, 2011, Pages 870-879

Microstructural evolution and tribological behavior of Mo-Cu-N coatings as a function of Cu content

(3) Shin, Jung Ho a Wang, Qi Min a Kim, Kwang Ho a

a Pusan National University (South Korea)

Author keywords

Ionic potential; Lubricious oxides; Mo Cu N; Physical vapor deposition; X ray photoelectron spectroscopy

Indexed keywords

AISI 304; COPPER CONTENT; CU CONTENT; DIFFRACTION PEAKS; ELEMENTAL TARGETS; FACE-CENTERED CUBIC; FRICTION COEFFICIENTS; IONIC POTENTIAL; LUBRICIOUS OXIDES; MAGNETRON CO-SPUTTERING; MO-CU-N; SI WAFER; TRIBOLOGICAL BEHAVIORS; TRIBOLOGICAL PROPERTIES;

COATINGS; FRICTION; GRAIN REFINEMENT; MAGNETRONS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLYBDENUM OXIDE;

EID: 80054018698 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2011.08.002 Document Type: Article

Times cited : (59)

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